The Plasma Chemistry And Plasma Processing is reputed journal publishes research related to Chemical Engineering; Chemistry; Materials Science; Physics and Astronomy. The ISSN of the journal is 1572-8986.
Through this web page, researchers can check the indexing, publication fee, journal quartile, and journal aim & scope.
| Journal Title | PLASMA CHEMISTRY AND PLASMA PROCESSING |
|---|---|
| Publisher | SPRINGER |
| Publication Country | ONE NEW YORK PLAZA, SUITE 4600 , NEW YORK, United States, NY, 10004 |
| ISSN | 1572-8986 |
| Publication Area | Engineering, Chemical | Physics, Applied | Physics, Fluids & Plasmas |
| Publication Language | English |
| Review Process | |
| Scopus Indexed | Yes |
The Impact Factor of Plasma Chemistry And Plasma Processing in 2026 is 2.6.
The Plasma Chemistry And Plasma Processing is ranked in Q2.
The Plasma Chemistry And Plasma Processing is indexed in: Scopus, Web of Science, UGC CARE Group 2.